JPH0538050Y2 - - Google Patents

Info

Publication number
JPH0538050Y2
JPH0538050Y2 JP1988171111U JP17111188U JPH0538050Y2 JP H0538050 Y2 JPH0538050 Y2 JP H0538050Y2 JP 1988171111 U JP1988171111 U JP 1988171111U JP 17111188 U JP17111188 U JP 17111188U JP H0538050 Y2 JPH0538050 Y2 JP H0538050Y2
Authority
JP
Japan
Prior art keywords
filament
evaporation source
magnetic field
crucible
magnet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1988171111U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0291145U (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988171111U priority Critical patent/JPH0538050Y2/ja
Publication of JPH0291145U publication Critical patent/JPH0291145U/ja
Application granted granted Critical
Publication of JPH0538050Y2 publication Critical patent/JPH0538050Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
JP1988171111U 1988-12-30 1988-12-30 Expired - Lifetime JPH0538050Y2 (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988171111U JPH0538050Y2 (en]) 1988-12-30 1988-12-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988171111U JPH0538050Y2 (en]) 1988-12-30 1988-12-30

Publications (2)

Publication Number Publication Date
JPH0291145U JPH0291145U (en]) 1990-07-19
JPH0538050Y2 true JPH0538050Y2 (en]) 1993-09-27

Family

ID=31462651

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988171111U Expired - Lifetime JPH0538050Y2 (en]) 1988-12-30 1988-12-30

Country Status (1)

Country Link
JP (1) JPH0538050Y2 (en])

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6044392A (ja) * 1983-08-23 1985-03-09 Mitsubishi Electric Corp 転写型感熱記録用シ−ト

Also Published As

Publication number Publication date
JPH0291145U (en]) 1990-07-19

Similar Documents

Publication Publication Date Title
WO2008044194A3 (en) Electron optical apparatus, x-ray emitting device and method of producing an electron beam
JP2010521765A (ja) イオン源用前板
US6111934A (en) X-ray tube with electromagnetic electron beam deflector formed by laminating in planes oriented perpendicularly to the electron beam
JP4582065B2 (ja) 分析電磁石、その制御方法およびイオン注入装置
JPH0538050Y2 (en])
US20060197037A1 (en) Beam neutralization in low-energy high-current ribbon-beam implanters
JPH0799720B2 (ja) 高速原子線源
CA1136764A (en) Trirotron: triode rotating beam radio-frequency amplifier
US4180760A (en) Flat cathode ray tube having magnetically collimated electron beam device
JPH0538049Y2 (en])
JPH03190044A (ja) 電子線加速器
US5029259A (en) Microwave electron gun
US7005795B2 (en) Electron bombardment of wide bandgap semiconductors for generating high brightness and narrow energy spread emission electrons
US20240321542A1 (en) X-ray generation device
JPH07161323A (ja) イオン源
JP7665449B2 (ja) X線発生装置
US20030001110A1 (en) System and method for amplifying an angle of divergence of a scanned ion beam
US2727171A (en) Ion trap for a cathode ray tube
JPH06231900A (ja) 線形電子加速装置
TW202135113A (zh) 電子槍裝置以及蒸鍍裝置
JP3206506B2 (ja) 永久磁石により磁界にオフセットを付けた分析磁石を有するイオン注入装置
JP2524916Y2 (ja) 電子衝撃磁場偏向型蒸発源装置
JP3406156B2 (ja) 電子ビーム装置、電子ビーム軸合わせ方法および電子ビーム非点補正又は集束方法
CN105185678B (zh) X光管
SU999179A2 (ru) Микротрон